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X-Ray Metrology JV-QC3

X-Ray Metrology JV-QC3

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X-Ray Metrology JV-QC3

The JV-QC3 is the latest model in the long-established and well-proven QC range of High Resolution X-ray diffractometers, with over a 20-year pedigree, and hundreds in use around the world in compound semiconductor and silicon-germanium research and manufacturing facilities. It is a high resolution X-ray diffraction tool that is ideal for semiconductor development and quality control. It is used for the measurement of composition and thickness in epitaxial layers of almost any material. The system uses standard sealed tube optics, combined with a variety of beam conditioning crystals that can be optimized to give the highest combination of resolution and intensity for each application.