X Ray Metrology JVX7300LSI

X Ray Metrology JVX7300LSI

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X-Ray Metrology JVX7300LSI

The JVX7300LSI was designed for in-fab R&D and in-line production process monitoring of semiconductors materials. It enables fully automated characterisation of many advanced materials in the semiconductor industry.The standard configuration is the JVX7300L, which implements Scanning HRXRD, XRR, XRD, GI-XRD and WA-XRD. Featuring fully automated source optics, the system can switch between standard XRD, High-Resolution, and X-ray reflectivity modes without user intervention, even within the same recipe batch. Full automation of the alignment, measurement, analysis and reporting of the results ensures productive and fast characterisation of thin films. To allow in-plane XRD measurements, the optional I channel can be added.


  1. FinFET characterization, including epilayers
  2. III-V on Si for future node development
  3. GaN on Si for power transistors
  4. High-K thickness, density and crystallinity